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Now showing items 1-10 of 28
Alfven ion-ion hybrid wave heating in the Phaedrus-T tokamak
(American Institute of Physics, 1996)
Diagnostics for plasma processing (etching plasmas)
(American Institute of Physics, 1997)
Symmetric rate model for fluorocarbon plasma etching of SiO2
(American Institute of Physics, 1996)
Sheaths: More complicated than you think
(American Institute of Physics, 2005)
Secondary-Electron Emission-Capacitive Probes for Plasma Potential Measurements in Plasmas with Hot-Electrons
(American Institute of Physics, 1987)
Simple way to determine the edge of an electron-free sheath with an emissive probe
(American Institute of Physics, 2006)
Role of plasma-aided manufacturing in semiconductor fabrication
(IEEE, Piscataway, NJ, USA, 1998)
Double-layer-relevant laboratory results
(Publ by IEEE, Piscataway, NJ, USA, 1992)
Measurements on rotating ion cyclotron range of frequencies induced particle fluxes in axisymmetric mirror plasmas
(American Institute of Physics, 1997)